Perspectives on oblique angle deposition of thin films: From fundamentals to devices
Instituto de Ciencia de Materiales de Sevilla
Abstract
The oblique angle configuration has emerged as an invaluable tool for the deposition of nanostructured thin films. This review develops an up to date description of its principles, including the atomistic mechanisms governing film growth and nanostructuration possibilities, as well as a comprehensive description of the applications benefiting from its incorporation in actual devices. In contrast with other reviews on the subject, the electron beam assisted evaporation technique is analyzed along with other methods operating at oblique angles, including, among others, magnetron sputtering and pulsed laser or ion beam-assisted deposition techniques. To account for the existing differences between deposition in…
Citation impact
- FWCI
- 29.46
- Percentile
- 100%
- References
- 603
Authors
4Topics & keywords
- Materials science
- Thin film
- Deposition (geology)
- Nanotechnology
- Sputter deposition
- Evaporation
- Oblique case
- Pulsed laser deposition