Properties of Fluorinated Graphene Films
United States Naval Research Laboratory
Abstract
Graphene films grown on Cu foils have been fluorinated with xenon difluoride (XeF(2)) gas on one or both sides. When exposed on one side the F coverage saturates at 25% (C(4)F), which is optically transparent, over 6 orders of magnitude more resistive than graphene, and readily patterned. Density functional calculations for varying coverages indicate that a C(4)F configuration is lowest in energy and that the calculated band gap increases with increasing coverage, becoming 2.93 eV for one C(4)F configuration. During defluorination, we find hydrazine treatment effectively removes fluorine while retaining graphene's carbon skeleton. The same films may be fluorinated on both sides by transferring graphene to a…
Citation impact
- FWCI
- 40.34
- Percentile
- 100%
- References
- 36
Authors
11- JTJeremy T. RobinsonCorresponding
United States Naval Research Laboratory
- JSJames S. Burgess
United States Naval Research Laboratory
- CEChad E. Junkermeier
United States Naval Research Laboratory
- ŞCŞtefan C. Bǎdescu
United States Naval Research Laboratory
- TLT. L. Reinecke
United States Naval Research Laboratory
Topics & keywords
- Graphene
- Xenon difluoride
- Materials science
- Fluorine
- Band gap
- Silicon
- Substrate (aquarium)
- Graphene nanoribbons
- Affordable and clean energy