articleNano LettersJul 16, 2010Closed access

Properties of Fluorinated Graphene Films

United States Naval Research Laboratory

PubMed
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Abstract

Graphene films grown on Cu foils have been fluorinated with xenon difluoride (XeF(2)) gas on one or both sides. When exposed on one side the F coverage saturates at 25% (C(4)F), which is optically transparent, over 6 orders of magnitude more resistive than graphene, and readily patterned. Density functional calculations for varying coverages indicate that a C(4)F configuration is lowest in energy and that the calculated band gap increases with increasing coverage, becoming 2.93 eV for one C(4)F configuration. During defluorination, we find hydrazine treatment effectively removes fluorine while retaining graphene's carbon skeleton. The same films may be fluorinated on both sides by transferring graphene to a…

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Authors

11

Topics & keywords

Keywords
  • Graphene
  • Xenon difluoride
  • Materials science
  • Fluorine
  • Band gap
  • Silicon
  • Substrate (aquarium)
  • Graphene nanoribbons
UN Sustainable Development Goals
  • Affordable and clean energy
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