articleThin Solid FilmsJun 1, 2002Closed access

Electrical characterization of thin Al2O3 films grown by atomic layer deposition on silicon and various metal substrates

MDMarkus D. GronerJWJeffrey W. ElamFFF. FabreguetteSMSteven M. George

University of Colorado Boulder

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Abstract

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722
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15.83
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100%
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Authors

4

Topics & keywords

Topics
Keywords
  • Atomic layer deposition
  • Materials science
  • Dielectric
  • Analytical Chemistry (journal)
  • Thin film
  • Silicon
  • Ellipsometry
  • Capacitance
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