articleThin Solid FilmsApr 1, 2002Closed access

Atomic layer deposition (ALD): from precursors to thin film structures

MLMarkku LeskeläMRMikko Ritala

University of Helsinki

Indexed incrossref

Abstract

No abstract available for this paper.

Citation impact

1,286
total citations
FWCI
25.80
Percentile
100%
References
81
Citations per year

Authors

2

Topics & keywords

Topics
Keywords
  • Atomic layer deposition
  • Microelectronics
  • Deposition (geology)
  • Nitride
  • Thin film
  • Materials science
  • Dielectric
  • Nanotechnology
No related works found for this paper.