Tuning the Graphene Work Function by Electric Field Effect
Pohang University of Science and Technology · Columbia University
Abstract
We report variation of the work function for single and bilayer graphene devices measured by scanning Kelvin probe microscopy (SKPM). By use of the electric field effect, the work function of graphene can be adjusted as the gate voltage tunes the Fermi level across the charge neutrality point. Upon biasing the device, the surface potential map obtained by SKPM provides a reliable way to measure the contact resistance of individual electrodes contacting graphene.
Citation impact
- FWCI
- 24.13
- Percentile
- 100%
- References
- 25
Authors
6- YYYoung-Jun YuCorresponding
Pohang University of Science and Technology, Columbia University
- YZYue Zhao
Columbia University, Pohang University of Science and Technology
- SRSunmin Ryu
Columbia University, Pohang University of Science and Technology
- LELouis E. Brus
Pohang University of Science and Technology, Columbia University
- KSKwang S. Kim
Columbia University, Pohang University of Science and Technology
Topics & keywords
- Graphene
- Work function
- Kelvin probe force microscope
- Electric field
- Biasing
- Bilayer graphene
- Scanning probe microscopy
- Work (physics)