reviewPlasma Sources Science and TechnologyApr 2, 2003Closed access

Carbon nanotube growth by PECVD: a review

Ames Research Center

Indexed incrossref

Abstract

Carbon nanotubes (CNTs), due to their unique electronic and extraordinary mechanical properties, have been receiving much attention for a wide variety of applications. Recently, plasma enhanced chemical vapour deposition (PECVD) has emerged as a key growth technique to produce vertically-aligned nanotubes. This paper reviews various plasma sources currently used in CNT growth, catalyst preparation and growth results. Since the technology is in its early stages, there is a general lack of understanding of growth mechanisms, the role of the plasma itself, and the identity of key species responsible for growth. This review is aimed at the low temperature plasma research community that has successfully addressed…

Citation impact

771
total citations
FWCI
21.93
Percentile
100%
References
66
Citations per year

Authors

4

Topics & keywords

Keywords
  • Plasma-enhanced chemical vapor deposition
  • Carbon nanotube
  • Nanotechnology
  • Chemical vapor deposition
  • Materials science
  • Plasma
  • Diamond
  • Thin film
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