Fully Transparent ZnO Thin‐Film Transistor Produced at Room Temperature
Uninova · University of Lisbon · +1 more institution
Abstract
Fully transparent thin-film transistors (TFTs) are produced at room temperature by radiofrequency magnetron sputtering. Measuring the drain current (IDS) as a function of drain voltage (VDS) at different gate voltages (VGS) shows the TFTs possess “hard saturation” with on-currents of about 0.2 mA (see Figure) and saturation mobilities of 20 cm2 V–1 s–1. The optical and electrical properties and the compatibility of the fabrication process with low-cost plastic substrates show promise for invisible and flexible electronic circuits.
Citation impact
- FWCI
- 45.72
- Percentile
- 100%
- References
- 10
Authors
7- EFElvira FortunatoCorresponding
- PBPedro Barquinha
Uninova, University of Lisbon, Universidade Nova de Lisboa
- APAna Pimentel
University of Lisbon, Uninova, Universidade Nova de Lisboa
- AGA. Gonçalves
Uninova, Universidade Nova de Lisboa, University of Lisbon
- AMAC Marques
Uninova, Universidade Nova de Lisboa, University of Lisbon
Topics & keywords
- Materials science
- Thin-film transistor
- Optoelectronics
- Transistor
- Fabrication
- Sputter deposition
- Saturation (graph theory)
- Electronic circuit
- Affordable and clean energy