Recent progress in nanoimprint technology and its applications

Nanoimprint is an emerging lithographic technology that promises high-throughput patterning of nanostructures. Based on the mechanical embossing principle, nanoimprint technique can achieve pattern resolutions beyond the limitations set by the light diffractions or beam scatterings in other conventional techniques. This article reviews the basic principles of nanoimprint technology and some of the recent progress in this field. It also explores a few alternative approaches that are related to nanoimprint as well as additive approaches for patterning polymer structures. Nanoimprint technology can not only create resist patterns as in lithography but can also imprint functional device structures in polymers.…

• NS
  National Science Foundation
• UO
  University of Michigan
• AS
  Arizona State University
• DA
  Defense Advanced Research Projects Agency
• IO
  Institute of Materials Research and Engineering
• OO
  Office of Naval Research
• AF
  Air Force Office of Scientific Research