Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

Bang, Joona; Jeong, Unyong; Ryu, Du Yeol; Russell, Thomas P.; Hawker, Craig J.

doi:10.1002/adma.200803302

articleAdvanced MaterialsJul 29, 2009Closed access

Block Copolymer Nanolithography: Translation of Molecular Level Control to Nanoscale Patterns

JBJoona Bang UJUnyong Jeong DYDu Yeol Ryu TPThomas P. Russell CJCraig J. Hawker

Korea University · Korea University · +3 more institutions

PubMed

Indexed incrossrefpubmed

Abstract

The self-asembly of block copolymers is a promising platform for the "bottom-up" fabrication of nanostructured materials and devices. This review covers some of the advances made in this field from the laboratory setting to applications where block copolymers are in use.

Citation impact

678

total citations

FWCI: 24.29
Percentile: 100%
References: 254

Citations per year

Authors

JB
Joona Bang
Korea University, Korea University
UJ
Unyong Jeong
Yonsei University
DY
Du Yeol Ryu
Yonsei University
TP
Thomas P. RussellCorresponding
University of California, Santa Barbara, University of Massachusetts Amherst
CJ
Craig J. HawkerCorresponding
University of California, Santa Barbara, University of Massachusetts Amherst

Topics & keywords

Topics

Block Copolymer Self-Assembly100%
Advanced Polymer Synthesis and Characterization100%
Nanopore and Nanochannel Transport Studies99%

Keywords

Copolymer
Materials science
Nanolithography
Nanotechnology
Nanoscopic scale
Fabrication
Block (permutation group theory)
Nanostructure

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