Graphene Annealing: How Clean Can It Be?
National Tsing Hua University · National Institute of Advanced Industrial Science and Technology
Abstract
Surface contamination by polymer residues has long been a critical problem in probing graphene's intrinsic properties and in using graphene for unique applications in surface chemistry, biotechnology, and ultrahigh speed electronics. Poly(methyl methacrylate) (PMMA) is a macromolecule commonly used for graphene transfer and device processing, leaving a thin layer of residue to be empirically cleaned by annealing. Here we report on a systematic study of PMMA decomposition on graphene and of its impact on graphene's intrinsic properties using transmission electron microscopy (TEM) in combination with Raman spectroscopy. TEM images revealed that the physisorbed PMMA proceeds in two steps of weight loss in…
Citation impact
- FWCI
- 25.82
- Percentile
- 100%
- References
- 35
Authors
6- YLYung‐Chang LinCorresponding
National Tsing Hua University
- CLChun‐Chieh Lu
National Tsing Hua University
- CYChao‐Hui Yeh
National Tsing Hua University
- CJChuanhong Jin
National Institute of Advanced Industrial Science and Technology
- KSKazu Suenaga
National Institute of Advanced Industrial Science and Technology
Topics & keywords
- Graphene
- Raman spectroscopy
- Annealing (glass)
- Materials science
- Polymer
- Nanotechnology
- Graphene nanoribbons
- Chemical vapor deposition