articleNano LettersJan 29, 2014Closed access

Role of the Seeding Promoter in MoS 2 Growth by Chemical Vapor Deposition

Massachusetts Institute of Technology · National Tsing Hua University

PubMed
Indexed incrossrefpubmed

Abstract

The thinnest semiconductor, molybdenum disulfide (MoS2) monolayer, exhibits promising prospects in the applications of optoelectronics and valleytronics. A uniform and highly crystalline MoS2 monolayer in a large area is highly desirable for both fundamental studies and substantial applications. Here, utilizing various aromatic molecules as seeding promoters, a large-area, highly crystalline, and uniform MoS2 monolayer was achieved with chemical vapor deposition (CVD) at a relatively low growth temperature (650 °C). The dependence of the growth results on the seed concentration and on the use of different seeding promoters is further investigated. It is also found that an optimized concentration of seed…

Citation impact

692
total citations
FWCI
37.17
Percentile
100%
References
45
Citations per year

Authors

7

Topics & keywords

Keywords
  • Monolayer
  • Chemical vapor deposition
  • Molybdenum disulfide
  • Materials science
  • Nucleation
  • Seeding
  • Nanotechnology
  • Graphene
No related works found for this paper.

Funding