Plasmonic Films Can Easily Be Better: Rules and Recipes
Abstract
High-quality materials are critical for advances in plasmonics, especially as researchers now investigate quantum effects at the limit of single surface plasmons or exploit ultraviolet- or CMOS-compatible metals such as aluminum or copper. Unfortunately, due to inexperience with deposition methods, many plasmonics researchers deposit metals under the wrong conditions, severely limiting performance unnecessarily. This is then compounded as others follow their published procedures. In this perspective, we describe simple rules collected from the surface-science literature that allow high-quality plasmonic films of aluminum, copper, gold, and silver to be easily deposited with commonly available equipment (a…
Citation impact
- FWCI
- 49.09
- Percentile
- 100%
- References
- 39
Authors
7- KMKevin M. McPeakCorresponding
ETH Zurich
- SVSriharsha V. Jayanti
ETH Zurich
- SJStephan J. P. Kress
ETH Zurich
- SMStefan Meyer
ETH Zurich
- SIStelio Iotti
ETH Zurich
Topics & keywords
- Plasmon
- Limiting
- Surface plasmon
- Thermal
- Exploit
- Limit (mathematics)
- Deposition (geology)
- Thin film