articleACS PhotonicsFeb 3, 2015HYBRID OA

Plasmonic Films Can Easily Be Better: Rules and Recipes

KMKevin M. McPeakSVSriharsha V. JayantiSJStephan J. P. KressSMStefan MeyerSIStelio Iotti

ETH Zurich

PubMed
Indexed inarxivcrossrefpubmed

Abstract

High-quality materials are critical for advances in plasmonics, especially as researchers now investigate quantum effects at the limit of single surface plasmons or exploit ultraviolet- or CMOS-compatible metals such as aluminum or copper. Unfortunately, due to inexperience with deposition methods, many plasmonics researchers deposit metals under the wrong conditions, severely limiting performance unnecessarily. This is then compounded as others follow their published procedures. In this perspective, we describe simple rules collected from the surface-science literature that allow high-quality plasmonic films of aluminum, copper, gold, and silver to be easily deposited with commonly available equipment (a…

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1,014
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Authors

7
  • KM
    Kevin M. McPeakCorresponding

    ETH Zurich

  • SV
    Sriharsha V. Jayanti

    ETH Zurich

  • SJ
    Stephan J. P. Kress

    ETH Zurich

  • SM
    Stefan Meyer

    ETH Zurich

  • SI
    Stelio Iotti

    ETH Zurich

Topics & keywords

Keywords
  • Plasmon
  • Limiting
  • Surface plasmon
  • Thermal
  • Exploit
  • Limit (mathematics)
  • Deposition (geology)
  • Thin film
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