Fully Room-Temperature-Fabricated Nonvolatile Resistive Memory for Ultrafast and High-Density Memory Application
Institute of Microelectronics · Chinese Academy of Sciences · +1 more institution
Abstract
Through a simple industrialized technique which was completely fulfilled at room temperature, we have developed a kind of promising nonvolatile resistive switching memory consisting of Ag/ZnO:Mn/Pt with ultrafast programming speed of 5 ns, an ultrahigh R(OFF)/R(ON) ratio of 10(7), long retention time of more than 10(7) s, good endurance, and high reliability at elevated temperatures. Furthermore, we have successfully captured clear visualization of nanoscale Ag bridges penetrating through the storage medium, which could account for the high conductivity in the ON-state device. A model concerning redox reaction mediated formation and rupture of Ag bridges is therefore suggested to explain the memory effect. The…
Citation impact
- FWCI
- 53.39
- Percentile
- 100%
- References
- 29
Authors
5- YYYuchao YangCorresponding
Institute of Microelectronics, Chinese Academy of Sciences, Tsinghua University
- FPFeng Pan
Tsinghua University, Chinese Academy of Sciences, Institute of Microelectronics
- QLQi Liu
Institute of Microelectronics, Tsinghua University, Chinese Academy of Sciences
- MLMing Liu
Tsinghua University, Institute of Microelectronics, Chinese Academy of Sciences
- FZFei Zeng
Tsinghua University, Chinese Academy of Sciences, Institute of Microelectronics
Topics & keywords
- Materials science
- Non-volatile memory
- Optoelectronics
- Resistive random-access memory
- Ultrashort pulse
- Nanotechnology
- Resistive touchscreen
- Computer science