Heat Generation and Transport in Nanometer-Scale Transistors
Stanford University · Intel (United States)
Abstract
As transistor gate lengths are scaled towards the 10-nm range, thermal device design is becoming an important part of microprocessor engineering. Decreasing dimensions lead to nanometer-scale hot spots in the transistor drain region, which may increase the drain series and source injection electrical resistances. Such trends are accelerated by the introduction of novel materials and nontraditional transistor geometries, including ultrathin body, FinFET, or nanowire devices, which impede heat conduction. Thermal analysis is complicated by subcontinuum phenomena including ballistic electron transport, which reshapes the heat generation region compared with classical diffusion theory predictions. Ballistic phonon…
Citation impact
- FWCI
- 9.84
- Percentile
- 100%
- References
- 67
Authors
3Topics & keywords
- Nanowire
- Materials science
- Thermal conduction
- Transistor
- Ballistic conduction
- Nanometre
- Optoelectronics
- Thermal conductivity