Double-Gate Tunnel FET With High- Gate Dielectric
École Polytechnique Fédérale de Lausanne
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Abstract
In this paper, we propose and validate a novel design for a double-gate tunnel field-effect transistor (DG tunnel FET), for which the simulations show significant improvements compared with single-gate devices using a gate dielectric. For the first time, DG tunnel FET devices, which are using a high-gate dielectric, are explored using realistic design parameters, showing an on-current as high as 0.23 mA for a gate voltage of 1.8 V, an off-current of less than 1 fA (neglecting gate leakage), an improved average subthreshold swing of 57 mV/dec, and a minimum point slope of 11 mV/dec. The 2D nature of tunnel FET current flow is studied, demonstrating that the current is not confined to a channel at the…
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Authors
2Topics & keywords
Topics
Keywords
- Gate dielectric
- Dielectric
- Electrical engineering
- Subthreshold conduction
- Subthreshold slope
- Field-effect transistor
- Transistor
- Optoelectronics
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