Present status of amorphous In–Ga–Zn–O thin-film transistors

Tokyo Institute of Technology

PubMed
Indexed incrossrefdoajpubmed

Abstract

The present status and recent research results on amorphous oxide semiconductors (AOSs) and their thin-film transistors (TFTs) are reviewed. AOSs represented by amorphous In-Ga-Zn-O (a-IGZO) are expected to be the channel material of TFTs in next-generation flat-panel displays because a-IGZO TFTs satisfy almost all the requirements for organic light-emitting-diode displays, large and fast liquid crystal and three-dimensional (3D) displays, which cannot be satisfied using conventional silicon and organic TFTs. The major insights of this review are summarized as follows. (i) Most device issues, such as uniformity, long-term stability against bias stress and TFT performance, are solved for a-IGZO TFTs. (ii) A…

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1,907
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77.38
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100%
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Authors

3

Topics & keywords

Keywords
  • Materials science
  • Thin-film transistor
  • Amorphous solid
  • Thin film
  • Optoelectronics
  • Transistor
  • Nanotechnology
  • Engineering physics
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