Radiation Effects in MOS Oxides
Sandia National Laboratories · Vanderbilt University · +2 more institutions
Abstract
Electronic devices in space environments can contain numerous types of oxides and insulators. Ionizing radiation can induce significant charge buildup in these oxides and insulators leading to device degradation and failure. Electrons and protons in space can lead to radiation-induced total-dose effects. The two primary types of radiation-induced charge are oxide-trapped charge and interface-trap charge. These charges can cause large radiation-induced threshold voltage shifts and increases in leakage currents. Two alternate dielectrics that have been investigated for replacing silicon dioxide are hafnium oxides and reoxidized nitrided oxides (RNO). For advanced technologies, which may employ alternate…
Citation impact
- FWCI
- 15.60
- Percentile
- 100%
- References
- 146
Authors
7Topics & keywords
- Materials science
- Space charge
- Optoelectronics
- Radiation
- Dielectric
- Radiation hardening
- Electron
- Ionizing radiation