articleIEEE Transactions on Nuclear ScienceAug 1, 2008Closed access

Radiation Effects in MOS Oxides

Sandia National Laboratories · Vanderbilt University · +2 more institutions

Indexed incrossref

Abstract

Electronic devices in space environments can contain numerous types of oxides and insulators. Ionizing radiation can induce significant charge buildup in these oxides and insulators leading to device degradation and failure. Electrons and protons in space can lead to radiation-induced total-dose effects. The two primary types of radiation-induced charge are oxide-trapped charge and interface-trap charge. These charges can cause large radiation-induced threshold voltage shifts and increases in leakage currents. Two alternate dielectrics that have been investigated for replacing silicon dioxide are hafnium oxides and reoxidized nitrided oxides (RNO). For advanced technologies, which may employ alternate…

Citation impact

929
total citations
FWCI
15.60
Percentile
100%
References
146
Citations per year

Authors

7

Topics & keywords

Keywords
  • Materials science
  • Space charge
  • Optoelectronics
  • Radiation
  • Dielectric
  • Radiation hardening
  • Electron
  • Ionizing radiation
No related works found for this paper.