Strain and structure heterogeneity in MoS2 atomic layers grown by chemical vapour deposition
Nanyang Technological University · DEVCOM Army Research Laboratory · +4 more institutions
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Abstract
No abstract available for this paper.
Citation impact
587
total citations
- FWCI
- 19.58
- Percentile
- 100%
- References
- 48
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Authors
16Topics & keywords
Topics
Keywords
- Monolayer
- Molybdenum disulfide
- Photoluminescence
- Chemical vapor deposition
- Materials science
- Strain (injury)
- Nanotechnology
- Optoelectronics
No related works found for this paper.
Funding
- NSNational Science FoundationAwards: 0821727, C-1716, OCI-0959097, 0959097, 1327093
- UDU.S. Department of EnergyAward: OCI-0959097
- SRSemiconductor Research Corporation
- WFWelch FoundationAwards: -1066, C-1716
- BBattelle
- UUT-Battelle
- NRNational Research Foundation
- NRNational Research Foundation SingaporeAward: NRF-RF2013-08
- NTNanyang Technological UniversityAward: M4081137.070
- DADefense Advanced Research Projects Agency
- MUMultidisciplinary University Research Initiative
- OOOffice of Naval ResearchAward: N000014-09-1-1066
- DODivision of Electrical, Communications and Cyber SystemsAward: ECCS-1327093
- BEBasic Energy Sciences
- LDLaboratory Directed Research and Development
- ARArmy Research OfficeAwards: OCI-0959097, W911NF-11-1-0362, MURI grant W911NF-11-1-0362, W911NF, W911NF-11
- OROak Ridge National Laboratory