reviewThin Solid FilmsJun 1, 2006GREEN OA

Ionized physical vapor deposition (IPVD): A review of technology and applications

UHUlf HelmerssonMLMartina LattemannJBJohan BöhlmarkAPArutiun P. EhiasarianJTJón Tómas Guðmundsson

Linköping University · Sheffield Hallam University · +1 more institution

Indexed incrossref

Abstract

No abstract available for this paper.

Citation impact

1,052
total citations
FWCI
72.95
Percentile
100%
References
170
Citations per year

Authors

5

Topics & keywords

Topics
Keywords
  • High-power impulse magnetron sputtering
  • Sputtering
  • Sputter deposition
  • Cavity magnetron
  • Physical vapor deposition
  • Thin film
  • Argon
  • Chemistry
UN Sustainable Development Goals
  • Affordable and clean energy
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