X-rays and extreme ultraviolet radiation principles and applications
University of California, Berkeley
Abstract
With this fully updated second edition, readers will gain a detailed understanding of the physics and applications of modern X-ray and EUV radiation sources. Taking into account the most recent improvements in capabilities, coverage is expanded to include new chapters on free electron lasers (FELs), laser high harmonic generation (HHG), X-ray and EUV optics, and nanoscale imaging; a completely revised chapter on spatial and temporal coherence; and extensive discussion of the generation and applications of femtosecond and attosecond techniques. Readers will be guided step by step through the mathematics of each topic, with over 300 figures, 50 reference tables and 600 equations enabling easy understanding of…
Citation impact
- FWCI
- —
- Percentile
- —
- References
- 686
Authors
2- DADavid AttwoodCorresponding
University of California, Berkeley
- SASakdinawat, Anne
Topics & keywords
- Extreme ultraviolet lithography
- Extreme ultraviolet
- Synchrotron radiation
- Optics
- Engineering physics
- Lithography
- Coherence (philosophical gambling strategy)
- Physics