Recent progress in Ga 2 O 3 power devices
National Institute of Information and Communications Technology · Tokyo University of Agriculture and Technology
Abstract
This is a review article on the current status and future prospects of the research and development on gallium oxide (Ga2O3) power devices. Ga2O3 possesses excellent material properties, in particular for power device applications. It is also attractive from an industrial viewpoint since large-size, high-quality wafers can be manufactured from a single-crystal bulk synthesized by melt–growth methods. These two features have drawn much attention to Ga2O3 as a new wide bandgap semiconductor following SiC and GaN. In this review, we describe the recent progress in the research and development on fundamental technologies of Ga2O3 devices, covering single-crystal bulk and wafer production, homoepitaxial thin film…
Citation impact
- FWCI
- 38.84
- Percentile
- 100%
- References
- 45
Authors
8- MHMasataka HigashiwakiCorresponding
National Institute of Information and Communications Technology
- KSKohei Sasaki
National Institute of Information and Communications Technology
- HMHisashi Murakami
Tokyo University of Agriculture and Technology
- YKYoshinao Kumagai
Tokyo University of Agriculture and Technology
- AKAkinori Koukitu
Tokyo University of Agriculture and Technology
Topics & keywords
- Materials science
- Optoelectronics
- Wafer
- Molecular beam epitaxy
- Epitaxy
- Schottky diode
- Semiconductor
- Diode
- Industry, innovation and infrastructure