Synthesis of large-area multilayer hexagonal boron nitride for high material performance
Korea Advanced Institute of Science and Technology · Korea Institute of Science and Technology · +5 more institutions
Abstract
Although hexagonal boron nitride (h-BN) is a good candidate for gate-insulating materials by minimizing interaction from substrate, further applications to electronic devices with available two-dimensional semiconductors continue to be limited by flake size. While monolayer h-BN has been synthesized on Pt and Cu foil using chemical vapour deposition (CVD), multilayer h-BN is still absent. Here we use Fe foil and synthesize large-area multilayer h-BN film by CVD with a borazine precursor. These films reveal strong cathodoluminescence and high mechanical strength (Young's modulus: 1.16 ± 0.1 TPa), reminiscent of formation of high-quality h-BN. The CVD-grown graphene on multilayer h-BN film yields a high carrier…
Citation impact
- FWCI
- 20.08
- Percentile
- 100%
- References
- 68
Authors
14- SMSoo Min Kim
Korea Advanced Institute of Science and Technology, Korea Institute of Science and Technology, Massachusetts Institute of Technology
- AHAllen Hsu
Massachusetts Institute of Technology
- MHMin Ho Park
Sungkyunkwan University
- SHSang Hoon Chae
Institute for Basic Science, Sungkyunkwan University
- SJSeok Joon Yun
Institute for Basic Science, Sungkyunkwan University
Topics & keywords
- Materials science
- Chemical vapor deposition
- Graphene
- Substrate (aquarium)
- Borazine
- Boron nitride
- FOIL method
- Monolayer
Funding
- NSNational Science FoundationAwards: BK21-Plus, 1231319
- NRNational Research Foundation
- MOMinistry of Science, ICT and Future PlanningAwards: IBS-R011-D1, 2015R1C1A1A02037083
- KIKorea Institute of Science and Technology
- NRNational Research Foundation of KoreaAwards: IBS-R011-D1, 2015R1C1A1A02037083
- IFInstitute for Basic ScienceAwards: IBS-R011-D1, R011-D1
- DODivision of Materials ResearchAwards: 1231319, DMR-1231319