Electrochemical etching of Ti 2 AlC to Ti 2 CT x  (MXene) in low-concentration hydrochloric acid solution

Sun, W B; Shah, Smit A.; Chen, Yexiao; Tan, Zeyi; Gao, Huili; Habib, Touseef; Radović, Miladin; Green, Micah J.

doi:10.1039/c7ta05574a

articleJournal of Materials Chemistry AJan 1, 2017Closed access

Electrochemical etching of Ti 2 AlC to Ti 2 CT x (MXene) in low-concentration hydrochloric acid solution

WBW B Sun SASmit A. Shah YCYexiao Chen ZTZeyi Tan HGHuili Gao

Mitchell Institute · College Station Medical Center · +1 more institution

Indexed incrossref

Abstract

In this study, we successfully demonstrate the electrochemical etching of Al from porous Ti2AlC electrodes in dilute hydrochloric acid to form a layer of Ti2CTx MXene on Ti2AlC.

Citation impact

793

total citations

FWCI: 7.39
Percentile: 100%
References: 23

Citations per year

Authors

WB
W B Sun
Mitchell Institute, College Station Medical Center, Texas A&M University
SA
Smit A. Shah
Mitchell Institute, College Station Medical Center, Texas A&M University
YC
Yexiao Chen
Mitchell Institute, College Station Medical Center, Texas A&M University
ZT
Zeyi Tan
Mitchell Institute, College Station Medical Center, Texas A&M University
HG
Huili Gao
Mitchell Institute, College Station Medical Center, Texas A&M University

Topics & keywords

Topics

MXene and MAX Phase Materials100%
2D Materials and Applications98%
Ferroelectric and Negative Capacitance Devices98%

Keywords

Hydrochloric acid
Electrochemistry
Etching (microfabrication)
Materials science
Electrode
Porosity
Analytical Chemistry (journal)
Layer (electronics)

No related works found for this paper.

Funding

DO
Division of Materials Research
Award: 1410983