articleNature PhotonicsDec 24, 2009Closed access

Lithography gets extreme

CWChristian WagnerNHNoreen Harned

ASML (Netherlands)

Indexed incrossref

Abstract

No abstract available for this paper.

Citation impact

622
total citations
FWCI
10.37
Percentile
100%
References
0
Citations per year

Authors

2

Topics & keywords

Topics
Keywords
  • Extreme ultraviolet lithography
  • Photolithography
  • Lithography
  • Computational lithography
  • Next-generation lithography
  • Nanotechnology
  • Extreme ultraviolet
  • Materials science
UN Sustainable Development Goals
  • Quality Education
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