Scalable submicrometer additive manufacturing

High-throughput fabrication techniques for generating arbitrarily complex three-dimensional structures with nanoscale features are desirable across a broad range of applications. Two-photon lithography (TPL)-based submicrometer additive manufacturing is a promising candidate to fill this gap. However, the serial point-by-point writing scheme of TPL is too slow for many applications. Attempts at parallelization either do not have submicrometer resolution or cannot pattern complex structures. We overcome these difficulties by spatially and temporally focusing an ultrafast laser to implement a projection-based layer-by-layer parallelization. This increases the throughput up to three orders of magnitude and…

• LL
  Lawrence Livermore National Laboratory

  Award: LDRD-16-ERD-047