reviewMar 18, 2015GREEN OA

Plasmonic films can easily be better: Rules and recipes

ETH Zurich

Indexed indatacite

Abstract

ABSTRACT: High-quality materials are critical for advances in plasmonics, especially as researchers now investigate quantum effects at the limit of single surface plasmons or exploit ultraviolet- or CMOS-compatible metals such as aluminum or copper. Unfortunately, due to inexperience with deposition methods, many plasmonics researchers deposit metals under the wrong conditions, severely limiting perform-ance unnecessarily. This is then compounded as others follow their published procedures. In this perspective, we describe simple rules collected from the surface-science literature that allow high-quality plasmonic films of aluminum, copper, gold, and silver to be easily deposited with commonly available…

Citation impact

633
total citations
FWCI
46.73
Percentile
100%
References
44
Citations per year

Authors

7

Topics & keywords

Keywords
  • Plasmon
  • Materials science
  • Nanotechnology
  • Surface plasmon
  • Limiting
  • Ultraviolet
  • Optoelectronics
  • Engineering physics
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