reviewMaterials TodayJun 17, 2023Closed access

Trends in photoresist materials for extreme ultraviolet lithography: A review

XWXiaolin WangPTPeipei TaoQWQianqian WangRZRongbo ZhaoTLTianqi Liu

Tsinghua University

Indexed incrossref

Abstract

No abstract available for this paper.

Citation impact

181
total citations
FWCI
22.61
Percentile
100%
References
74
Citations per year

Authors

12

Topics & keywords

Topics
Keywords
  • Extreme ultraviolet lithography
  • Resist
  • Photoresist
  • Extreme ultraviolet
  • Lithography
  • Materials science
  • Nanotechnology
  • Microelectronics
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