Review of: "Amplification of Nano Wires Nano Wire by Electron Nano Lithography"

Potential competing interests: No potential competing interests to declare. Note: Electron beam nano-lithography is usually performed in a special environment or in equipment designed specifically for this purpose. In both cases, an electron beam with accurate focus isscanned sequentially along the sample to show resistance.The electron beam nano-lithography process is inherently slow compared to other methods because the electron beam requires a limited time at each point of exposure.It is rare to be exposed to a sample multiple times.Some developments are underway for multi-electron beam exposure .In contrast to long exposure times, very high resolution (below 100 nm) is typically achieved by electron beam…