Review of: "Block nanolithography Oriented copolymer is a combination of top-down lithography and the bottom-up self-organization of two polymers to produce high-resolution nanopatterns over large areas"

Radochevich, Prienna

doi:10.32388/a0nexa

preprintQeiosJan 8, 2024DIAMOND OA

Review of: "Block nanolithography Oriented copolymer is a combination of top-down lithography and the bottom-up self-organization of two polymers to produce high-resolution nanopatterns over large areas"

PRPrienna Radochevich

Nanosystems Initiative Munich

Indexed incrossref

Abstract

Review of: "Block nanolithography Oriented copolymer is a combination of top-down lithography and the bottom-up selforganization of two polymers to produce high-resolution nanopatterns over large areas" Prienna Radochevich 1

Citation impact

430

total citations

FWCI: 46.87
Percentile: 100%
References: 19

Citations per year

Authors

1

PR
Prienna RadochevichCorresponding
Nanosystems Initiative Munich

Topics & keywords

Topics

Keywords

Nanolithography
Materials science
Lithography
Nanotechnology
Copolymer
Polymer
Self-assembly
Dip-pen nanolithography

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