Flash healing of laser-induced graphene
City University of Hong Kong · City University of Hong Kong, Shenzhen Research Institute · +5 more institutions
Abstract
Abstract The advancement of laser-induced graphene (LIG) technology has streamlined the fabrications of flexible graphene devices. However, the ultrafast kinetics triggered by laser irradiation generates intrinsic amorphous characteristics, leading to high resistivity and compromised performance in electronic devices. Healing graphene defects in specific patterns is technologically challenging by conventional methods. Herein, we report the rapid rectification of LIG’s topological defects by flash Joule heating in milliseconds (referred to as F-LIG), whilst preserving its overall structure and porosity. The F-LIG exhibits a decreased I D / I G ratio from 0.84 – 0.33 and increased crystalline domain from Raman…
Citation impact
- FWCI
- 15.37
- Percentile
- 100%
- References
- 50
Authors
13- LCLe ChengCorresponding
City University of Hong Kong, City University of Hong Kong, Shenzhen Research Institute
- CSChi Shun Yeung
City University of Hong Kong, City University of Hong Kong, Shenzhen Research Institute
- LHLibei Huang
Hong Kong Polytechnic University, City University of Hong Kong
- YGYe Ge
City University of Hong Kong
- JYJie Yan
City University of Hong Kong
Topics & keywords
- Graphene
- Materials science
- Raman spectroscopy
- Optoelectronics
- Gauge factor
- Crystallinity
- Amorphous solid
- Nanotechnology
Funding
- UDU.S. Department of EnergyAwards: AC02-06CH11357, DE-AC02, 06CH11357, DE-AC02-06CH11357, DE-AC02-
- CUCity University of Hong KongAwards: 9667254, 9678274
- SKState Key Laboratory in Marine Pollution
- RGResearch Grants Council, University Grants CommitteeAward: 11309723
- IAInnovation and Technology CommissionAwards: CNERC14SC01, ITC-CNERC14SC01
- STScience, Technology and Innovation Commission of Shenzhen MunicipalityAward: JCYJ20220818101204009
- OOOffice of ScienceAwards: DE-AC02-06CH11357, DE-AC02, 06CH11357, AC02-06CH11357
- ANArgonne National LaboratoryAwards: DE-AC02, 06CH11357, AC02-06CH11357