25 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithography
Kunming University of Science and Technology · Kunming University · +12 more institutions
Abstract
One of the major challenges in the rapidly advancing field of nanophotonics is creating high-aspect-ratio nanostructures over large-area with consistent precision. Traditional techniques like photolithography and etching fall short, being limited to fabricating structures with a typical feature size of 100 nm and a maximum aspect ratio of 30:1. To break through these barriers, herein we introduce a strategy, called wet-chemical etching assisted aberration-enhanced single-pulsed femtosecond laser-supplemented nanolithography (WEALTH), for manufacturing large-area deep holey nanostructures. This strategy enables fabrication of nanostructures with diameters as small as 25 nm (exceeding 1/30 of Abbe’s diffraction…
Citation impact
- FWCI
- 45.46
- Percentile
- 100%
- References
- 94
Authors
18- ZCZhi ChenCorresponding
Kunming University of Science and Technology, Kunming University
- LZLijing Zhong
Ningbo University, Ningbo University of Technology
- XSXiangyu Sun
Zhejiang University
- YFYihui Fu
Wuhan National Laboratory for Optoelectronics, Huazhong University of Science and Technology
- HHH. H. He
Peng Cheng Laboratory
Topics & keywords
- Nanophotonics
- Nanolithography
- Materials science
- Etching (microfabrication)
- Photolithography
- Nanosphere lithography
- Nanotechnology
- Optoelectronics
Funding
- WUWestlake University
- NNNational Natural Science Foundation of ChinaAwards: 12404367, 62105297, 52432001, 62475244, 62375246
- ZUZhejiang University
- SCSouth China University of Technology
- SKState Key Laboratory of Luminescent Materials and Devices
- NSNatural Science Foundation of Zhejiang ProvinceAwards: LZ23F050002, LQ22F050022