Altermagnetic Proximity Effect
Eastern Institute of Technology · Suzhou University of Science and Technology · +1 more institution
Abstract
Proximity effects complement conventional materials design by enabling interfacial properties absent in any constituent. Here, we uncover an altermagnetic proximity effect (AMPE), distinct from ferromagnetic and antiferromagnetic proximity, in which the hallmark momentum-alternating spin splitting of an altermagnet is transferred across an interface into an adjacent nonmagnetic layer-a process we term "altermagnetization." Using first-principles calculations and model analysis, we identify the AMPE in heterostructures based on the prototypical van der Waals altermagnet V_{2}Se_{2}O, where a proximitized monolayer PbO acquires altermagnetic band splitting and real-space spin textures, with systematic tunability…
Citation impact
- FWCI
- 115.49
- Percentile
- 100%
- References
- 0
Authors
8- ZZZiye ZhuCorresponding
Eastern Institute of Technology
- RHRichang Huang
Eastern Institute of Technology
- XCXianzhang Chen
Eastern Institute of Technology
- ZCZhou Cui
Eastern Institute of Technology
- XDXunkai Duan
Eastern Institute of Technology
Topics & keywords
- Proximity effect (electron beam lithography)
- Monolayer
- Ferromagnetism
- van der Waals force
- Antiferromagnetism
- Spin (aerodynamics)
- Heterojunction
Funding
- UDU.S. Department of Energy
- NNNational Natural Science Foundation of ChinaAwards: 11904250, 12504108, 12474155
- CPChina Postdoctoral Science FoundationAward: 2025M773440
- OOOffice of Science
- OOOffice of Naval ResearchAward: MURI N000142212764
- BEBasic Energy SciencesAward: DE-SC0004890
- NSNatural Science Foundation of Zhejiang ProvinceAward: LR25A040001