High-efficiency submerged air jet chemical mechanical polishing at the atomic and close-to-atomic scale
Hong Kong Polytechnic University · Shenzhen University
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Abstract
No abstract available for this paper.
Citation impact
4
total citations
- FWCI
- 81.29
- Percentile
- 100%
- References
- 66
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Authors
7- ZZZili Zhang
Hong Kong Polytechnic University
- SYSong Yuan
Hong Kong Polytechnic University
- CFChi Fai CheungCorresponding
Hong Kong Polytechnic University
- WWWei Wu
Hong Kong Polytechnic University
- ZLZe Li
Hong Kong Polytechnic University
Topics & keywords
Topics
Keywords
- Polishing
- Chemical-mechanical planarization
- Brittleness
- Figuring
- Jet (fluid)
- Process (computing)
- Surface roughness
- Chemical process
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