Etching resistance and particle suppression behavior of Y₂O₃–ZrO₂ composite coatings in fluorine-based plasma

Yttrium oxide (Y₂O₃) coatings serve as essential barrier layers for protecting chamber surfaces from plasma-induced erosion and contamination during dry etching in semiconductor and display fabrication. With increasing device complexity and elevated plasma power conditions, the demand for enhanced coating performance has intensified to support stable processing and high production yields. Accordingly, there is growing interest in coating systems that can sustain harsh plasma etching while maintaining a clean processing environment. In this study, Y₂O₃–ZrO₂ composite coatings (hereafter referred to as YZ coatings) were fabricated via atmospheric plasma spraying (APS), and their durability was evaluated through…

• NR
  National Research Foundation of Korea

  Awards: RS-2024-00445081, RS-2023-00252720, RS-2023-00222070
• KI
  Korea Institute of Ceramic Engineering and Technology