Non-local bound states in the continuum for nanoscale alignment
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Abstract
In the semiconductor microelectronics industry, overcoming the limitations of the optical diffraction limit is crucial for multiple exposure alignment technology. Here we present a method that utilizes bound states in the continuum (BICs), a physical phenomenon in optics, to address this challenge. The transition from BIC to quasi-BIC caused by out-of-plane asymmetry (that is, displacements between different layers) is studied through simulations and experiments. Results illustrate the emergence of resonance and evolution in the quality factor with increasing asymmetry. Measured Q factors decrease from near-infinite to 66 as the displacement increases from 0 to 110 nm, providing a sensitive metric for…
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Topics
Keywords
- Microelectronics
- Asymmetry
- Lithography
- Photonics
- Bound state
- Semiconductor
- Nanoscopic scale
- Quality (philosophy)
UN Sustainable Development Goals
- Industry, innovation and infrastructure
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